发明名称 CLEANING METHOD OF PRINT MASK AND APPARATUS THEREOF
摘要 PROBLEM TO BE SOLVED: To start cleaning with a cleaning cloth of a clean state by making an end position and a start position of the cleaning separate so as not to wipe the dirt of the flux etc. that remain at an end position of the cleaning off at the wiping operation start.SOLUTION: First, cleaning of a print mask lower surface is done by arranging a wiping device that moves in a horizontal direction under a print mask 3, and after making the wiping device touch the lower surface of the print mask and move outward, making the wiping device touch the lower surface of the print mask 3 and move the way back. Secondarily, the wiping is started by making the wiping start position in the way back movement of the wiping device as a displaced position from a wiping end position in the start position direction in the outward movement. Thirdly, wiping is started by making the wiping start position in the way movement of the wiping device is assumed to be a position moved from the wiping end position in the way back movement to the start position direction in the way back movement.
申请公布号 JP2013230634(A) 申请公布日期 2013.11.14
申请号 JP20120104349 申请日期 2012.05.01
申请人 SHIBUYA KOGYO CO LTD 发明人 IKEDA KAZUO
分类号 B41F35/00;H05K3/34 主分类号 B41F35/00
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