| 摘要 |
PROBLEM TO BE SOLVED: To provide a phase inversion blank mask and a manufacturing method of the same.SOLUTION: A phase inversion blank mask includes two or more layers of continuous films, or phase inversion films in which a plurality of layer films are formed, is formed to have a thin phase inversion film arranged on the uppermost part of the phase inversion films, and is formed including a minute amount of oxygen (O) so as to be excellent in chemical resistance and durability. This provides the phase inversion blank mask including phase inversion films exhibiting excellent chemical resistance and durability with respect to cleaning solutions containing acid and basic substances used in repeated cleaning steps in manufacturing a photomask, to high temperature water and ozone water, by the phase inversion film arranged on the uppermost part and excellent in chemical resistance and durability. In addition, the phase inversion film arranged on the uppermost part and excellent in chemical resistance and durability prevents the refractive index and phase inversion amount of the phase inversion film from changing in the repeated cleaning steps, and provides the phase inversion blank mask including a thin phase inversion film. |
