发明名称 III-V COMPOUND SEMICONDUCTOR DEVICE HAVING DOPANT LAYER AND METHOD OF MAKING THE SAME
摘要 A semiconductor device comprises a semiconductor substrate; a channel layer of at least one III-V semiconductor compound above the semiconductor substrate; a gate electrode above a first portion of the channel layer; a source region and a drain region above a second portion of the channel layer; and a dopant layer comprising at least one dopant contacting the second portion of the channel layer.
申请公布号 US2013299895(A1) 申请公布日期 2013.11.14
申请号 US201213467133 申请日期 2012.05.09
申请人 OXLAND RICHARD KENNETH;VAN DAL MARK;TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 OXLAND RICHARD KENNETH;VAN DAL MARK
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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