摘要 |
An ion implantation apparatus, an ion implantation method, a liquid crystal display device and a method of manufacturing the liquid crystal display device are provided to reduce the process time by simultaneously performing an ion implantation process and an annealing process in single unit. An ion implantation apparatus includes a loading chamber and an ion implantation chamber connected to the loading chamber, in which an ion implantation process is subjected to a substrate. The substrate implanted with ion is subjected to an annealing process in the loading chamber. The loading chamber includes a body(31), plural first heat generating parts(33a) disposed in an upper inner surface of the body, and plural second heat generating parts(33b) disposed in a lateral inner surface of the body. The loading chamber includes a reflector disposed in a lower inner surface of the body. |