| 摘要 |
The present invention relates to a substrate processing apparatus. Particularly, the substrate processing apparatus performs a thermal process on the substrate of a flat display panel. The substrate processing apparatus according to the embodiment of the present invention includes a process chamber having a substrate processing space, a heating lamp generating radiation energy, a heating housing with a reflection block for reflecting the radiation energy generated from the heating lamp, a window sealing between the heating housing and the process chamber and transmitting the radiation energy to the substrate. |
