发明名称 |
Method for treating surface of glass substrate and apparatus for performing same |
摘要 |
A method for treating a surface of a glass substrate according to the invention has the steps of placing the glass substrate into a vacuum treatment chamber, introducing a gas into the vacuum treatment chamber, providing electric power to generate an ion source and using the ion source to treat the surface of the glass substrate. By this way, the invention can achieve an effect of surface cleaning and further render the conductive film to be coated on the glass substrate in the subsequent stage to have a reduced surface resistance, thereby improving the conductivity of the glass substrate. The film coated on the glass substrate in the subsequent stage will have higher crystalline level as well.
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申请公布号 |
US8580353(B2) |
申请公布日期 |
2013.11.12 |
申请号 |
US20100832738 |
申请日期 |
2010.07.08 |
申请人 |
WENG CHIEN-MIN;CHOU SHIH-LIANG;CHU TZU-WEN;WANG FU-JEN;APPLIED VACUUM COATING TECHNOLOGIES CO., LTD. |
发明人 |
WENG CHIEN-MIN;CHOU SHIH-LIANG;CHU TZU-WEN;WANG FU-JEN |
分类号 |
H05H1/00;C23C14/02 |
主分类号 |
H05H1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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