FLUID CONTROL SYSTEM AND FLUID CONTROL METHOD

摘要

PROBLEM TO BE SOLVED: To shorten a pressure control time in a vacuum chamber, and to decrease the manufacturing costs of a semiconductor or the like.SOLUTION: A vacuum control system 1 includes: a vacuum chamber 11; a gas supply source 18 for supplying gas; exhaust piping 12 for exhausting the fluid of the vacuum chamber 11; gas supply piping 15 for connecting the vacuum chamber 11 to the gas supply source 18; a pressure sensor 19 for detecting a pressure value in the vacuum chamber 11; a flow meter 17 disposed between the gas supply source 18 and the vacuum chamber 11; a proportional valve 16 disposed between the flow meter 17 and the vacuum chamber 11; a pressure controller 22 for controlling the proportional valve 16 by receiving the output of the pressure sensor 19; a throttle valve 13 disposed on the exhaust piping 12; and a flow rate controller for controlling the throttle valve 13 by receiving the output of the flow meter 17.