发明名称 SEMICONDUCTOR DEVICE AND METHOD OF FABRICATING
摘要 A semiconductor device includes a semiconductor substrate, an isolation structure disposed in the semiconductor substrate, a conductive layer disposed over the isolation structure, a capacitor disposed over the isolation structure, the capacitor including a top electrode, a bottom electrode, and a dielectric disposed between the top electrode and the bottom electrode, and a first contact electrically coupling the conductive layer and the bottom electrode, the bottom electrode substantially engaging the first contact on at least two faces.
申请公布号 US2013292794(A1) 申请公布日期 2013.11.07
申请号 US201213462427 申请日期 2012.05.02
申请人 PAI CHIH-YANG;TU KUO-CHI;CHIANG WEN-CHUAN;CHOU CHUNG-YEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 PAI CHIH-YANG;TU KUO-CHI;CHIANG WEN-CHUAN;CHOU CHUNG-YEN
分类号 H01L29/92;H01L21/762 主分类号 H01L29/92
代理机构 代理人
主权项
地址