| 摘要 |
PROBLEM TO BE SOLVED: To provide novel acrylic ester derivatives having excellent lithography properties such as LWR (Line Width Roughness) to achieve high resolution when used as one of the constituent units of a polymer compound to be contained in a photoresist composition.SOLUTION: Acrylic ester derivatives are represented by general formula (1). In the formula, Ris a hydrogen atom or a 1-5C alkyl group; Ris a hydrogen atom, a 1-5C alkyl group, or a 1-5C halogenated alkyl group; X is a 1-5C alkylene group which may include an oxygen atom or a sulfur atom, an oxygen atom, or a sulfur atom. |
