| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive siloxane composition capable of obtaining a cured film having such a proper development margin that a proper pattern profile can be formed even after the lapse of the optimum developing time in a developing step, high heat resistance and high transparency properties, and further to provide a cured film such as a flattening film for a TFT substrate made of the photosensitive composition, an insulating film for a touch panel and a protective film and a display element having the cured film.SOLUTION: There is provided a photosensitive siloxane composition which comprises: (a) a polysiloxane synthesized by reacting one or more organosilanes having a specific structure; (b) a solvent; and a naphthoquinonediazide compound, wherein the composition contains (c1) a naphthoquinonediazide compound having an esterification rate of 60% or more and (c2) a naphthoquinonediazide compound having an esterification rate of less than 60% as the naphthoquinonediazide compound, and (c) the naphthoquinonediazide compound has an average esterification rate of 45 to 72%. |
