发明名称 SUBSTRATE PROCESSING APPARATUS AND DEPOSITION MATERIALS FEEDING MODULE THEREFOR
摘要 The present invention relates to a substrate deposition device and, more particularly, to a substrate deposition device and a deposition material supply module for the same processing deposition through evaporation. The present invention comprises the following: a vacuum chamber having a sealed processing space inside; one or more evaporation sources in which deposition materials are evaporated; a deposition material supply part having a deposition material accommodating part containing deposition materials; and a deposition material transferring part for transferring deposition materials to the evaporation sources from the deposition material supply part. The deposition material supply part comprises a base part having one or more openings for deposition materials to fall; and a plurality of feeding units including disks which are installed on the upper side of the base part and in which deposition material accommodating units, penetrated from top to bottom, are arranged in the circumferential direction and consecutively located in the openings of the base part by the rotation. On the substrate deposition device, the feeding units are arranged on top of each other.
申请公布号 KR20130121435(A) 申请公布日期 2013.11.06
申请号 KR20120044629 申请日期 2012.04.27
申请人 WONIK IPS CO., LTD. 发明人 KIM, GEON;YANG, HO SIK
分类号 H01L51/56;C23C14/24 主分类号 H01L51/56
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