发明名称 TWO-DIMENSIONAL APERTURE ARRAY FOR VAPOR DEPOSITION
摘要 A method for forming a layer on a surface in making a device, including providing a distribution member for receiving vaporized material, the distribution member having one or more walls defining a polygonal two-dimensional pattern of apertures is formed in a wall, which deliver vaporized material in a molecular flow onto the surface; providing the polygonal two-dimensional pattern of apertures to have at least four vertices, with a first set of apertures disposed at the vertices, a second set of edge apertures disposed between the apertures of the first set and defining the edges of the polygonal two-dimensional pattern, and a third set of interior apertures disposed within the periphery of the polygonal two-dimensional pattern defined by the first and second sets of apertures; and dimensioning the apertures to obtain a desired flow rate.
申请公布号 KR101326147(B1) 申请公布日期 2013.11.06
申请号 KR20087017307 申请日期 2007.01.05
申请人 发明人
分类号 C23C16/00;C23C16/455 主分类号 C23C16/00
代理机构 代理人
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