SUBSTRATE PROCESSING APPARATUS AND NOZZLE

摘要

A substrate processing device comprises a substrate support unit supporting a substrate; a spray unit spraying the droplet of a processing solution from a plurality of nozzles to a plurality of crash positions in the substrate; and a liquid film formation unit. The liquid film formation unit forms the liquid film of protective solutions covering the crash positions by discharging the protective solutions from a plurality of discharge ports to a plurality of solution positions in the substrate. [Reference numerals] (AA) Processing liquid;(BB) Protection liquid