发明名称 |
Resist composition for immersion exposure and method of forming resist pattern |
摘要 |
A resist composition for immersion exposure and a method of forming a resist pattern which can satisfy both of excellent resistance to an immersion medium and lithography properties. The resist composition for immersion exposure includes a resin component (A) which exhibits changed alkali solubility under action of acid and an acid-generator component (B) which generates acid upon irradiation, the resin component (A) including a resin (A1) which contains a fluorine atom and a resin (A2) which has a structural unit (a') derived from acrylic acid and contains no fluorine atom, and the amount of the resin (A1) contained in the resin component (A) being within the range from 0.1 to 50% by weight.
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申请公布号 |
US8574813(B2) |
申请公布日期 |
2013.11.05 |
申请号 |
US201213468747 |
申请日期 |
2012.05.10 |
申请人 |
IRIE MAKIKO;TOKYO OHKA KOGYO CO., LTD. |
发明人 |
IRIE MAKIKO |
分类号 |
G03F7/039;G03F7/20;G03F7/30 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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