发明名称 |
Resist composition and method for producing resist pattern |
摘要 |
A resist composition contains; a resin having a structural unit derived from a compound represented by the formula (a); and an acid generator. wherein R1 represents a hydrogen atom or a methyl group; R2 represents an optionally substituted C1 to C18 aliphatic hydrocarbon group; A1 represents an optionally substituted C1 to C6 alkanediyl group or a group represented by the formula (a-g1); wherein s represents 0 or 1; A10 and A12 independently represent an optionally substituted C1 to C5 aliphatic hydrocarbon group; A11 represents a single bond or an optionally substituted C1 to C5 aliphatic hydrocarbon group; X10 and X11 independently represents an oxygen atom, a carbonyl group, a carbonyloxy group or an oxycarbonyl group; provided that a total number of the carbon atom of A10, A11, A12, X10 and X11 is 6 or less.
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申请公布号 |
US8574811(B2) |
申请公布日期 |
2013.11.05 |
申请号 |
US201113221597 |
申请日期 |
2011.08.30 |
申请人 |
MASUYAMA TATSURO;YAMAMOTO SATOSHI;ICHIKAWA KOJI;SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
MASUYAMA TATSURO;YAMAMOTO SATOSHI;ICHIKAWA KOJI |
分类号 |
G03F7/004;G03F7/039;G03F7/30;G03F7/38 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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