| 摘要 |
PURPOSE: A gas supply unit of a chemical vapor deposition apparatus and a method for manufacturing the same are provided to uniformly supply process gas by using nozzles for different gas. CONSTITUTION: A first tube and a second tube(150,160) penetrate a first plate(110) and a second plate(120). A third plate is arranged on the upper part of the second plate. A discharging hole(132) removes foreign substances remaining in a gas chamber. A blocking member shields the discharging hole. |
