| 摘要 |
The invention provides a discharge nozzle system coating method photoresist composition for manufacturing an LCD-TFT substrate that will not form streak spots, or the like, at coating. The discharge nozzle system coating method photoresist composition contains (A) an alkali-soluble resin; (B) a photosensitizing agent, and (C) a fluorochemical surfactant which is a copolymer (P) obtained by copolymerizing a monomer mixture (m), comprising a monomer (m1) containing a fluorinated alkyl group shown by general Expression (1): CH2=CR<1>COOCH2CH2C8F17(R<1> is a hydrogen atom or a methyl group) and a monomer (m2) containing a polyoxypropylene chain shown by general Expression (2): CH2=CR2COO(C3H6O)nH (R<2> is a hydrogen atom or a methyl group, and n is 4 to 7 as an average of the distribution). The mixing ratio (m1)/(m2) of the monomers (m1) and (m2) in the monomer mixture (m) is 25/75 to 46/60 (ratio by weight), and the weight-average molecular weight of the copolymer (P) is 3,000 to 10,000. |
