发明名称 POWER DEVICE AND METHOD FOR FABRICATING THE SAME
摘要 A power device and a method for manufacturing the same according to the technical concept of the present invention are provided to have a field stop layer based on a semiconductor substrate between a collector region and a drift region in the structure of FS-IGBT, easily control the thickness of the field stop layer, and impurity concentrations in the collector region, and improve the function of the field stop layer. The power device comprises: a field stop layer which is formed on the basis of a first conductive semiconductor substrate; an implanted field stop layer which is formed on the field stop layer through a first conductive ion implant and has a part having concentration higher than that of the field stop layer; a drift region which is formed on the implanted field stop layer by growing a first conductive epitaxial layer and has concentration lower than that of the field stop layer; a base region of a second conductive type which is formed on the upper part of the drift region; an emitter region of a first conductive type which is formed on a surface part in a base region; a gate electrode which is formed by interposing a gate insulating layer on the drift region, the base region, and the emitter region; and a collector region of a second conductive type which is formed on the lower part of the field stop layer.
申请公布号 KR20130119873(A) 申请公布日期 2013.11.01
申请号 KR20130043817 申请日期 2013.04.19
申请人 FAIRCHILD KOREA SEMICONDUCTOR LTD. 发明人 LEE, KYU HYUN;LEE, SE KYEONG;YOON, DOO SEOK;KANG, SOO HYUN;CHOI, YOUNG CHUL
分类号 H01L29/739;H01L21/331 主分类号 H01L29/739
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