发明名称 |
REFLECTIVE EXTREME ULTRAVIOLET MASK AND METHOD OF FORMING A PATTERN USING THE SAME |
摘要 |
According to example embodiments, a reflective EUV mask may include a mask substrate, a patterned structure and a non-patterned structure on the mask substrate. At least one of the patterned structure and the non-patterned structure may include a thermally treated region configured to reduce a reflectivity of the respective patterned and non-patterned structure.
|
申请公布号 |
US2013288166(A1) |
申请公布日期 |
2013.10.31 |
申请号 |
US201313918693 |
申请日期 |
2013.06.14 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE DONG-GUN;KIM SEONG-SUE;KIM TAE-GEUN |
分类号 |
G03F1/24 |
主分类号 |
G03F1/24 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|