发明名称 LITHOGRAPHIC PROJECTION APPARATUS AND LIQUID IMMERSION EXPOSURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide an apparatus and method for keeping immersion liquid in a space adjacent to an optical assembly that projects an image onto a substrate, in a lithographic projection apparatus.SOLUTION: An insertion member 226 insertable into a space between an optical assembly 16 and a substrate 208 or/and a substrate table divides immersion liquid into a first portion and a second portion, the first portion located between the optical assembly 16 and the insertion member 226, the second portion located between the insertion member 226 and the substrate 208 or/and the substrate table. The insertion member 226 keeps the optical assembly 16 in contact with the first portion when the substrate 208 is moved away from the location adjacent to the optical assembly 16.
申请公布号 JP2013225693(A) 申请公布日期 2013.10.31
申请号 JP20130139931 申请日期 2013.07.03
申请人 NIKON CORP 发明人 POON ALEX KA TIM;LEONARD Y FANG COE;GAURAV KESWANI;DEREK COON;TANAKA TAISHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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