发明名称 DEVICE AND METHODS FOR HIGH-K AND METAL GATE STACKS
摘要 A semiconductor device having five gate stacks on different regions of a substrate and methods of making the same are described. The device includes a semiconductor substrate and isolation features to separate the different regions on the substrate. The different regions include a p-type field-effect transistor (pFET) core region, an input/output pFET (pFET IO) region, an n-type field-effect transistor (nFET) core region, an input/output nFET (nFET IO) region, and a high-resistor region.
申请公布号 US2013285151(A1) 申请公布日期 2013.10.31
申请号 US201213457079 申请日期 2012.04.26
申请人 WU WEI CHENG;CHEN PO-NIEN;NG JIN-AUN;YOUNG BAO-RU;CHUANG HARRY HAK-LAY;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 WU WEI CHENG;CHEN PO-NIEN;NG JIN-AUN;YOUNG BAO-RU;CHUANG HARRY HAK-LAY
分类号 H01L27/092;H01L21/336 主分类号 H01L27/092
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