发明名称 |
DIFFERENTIATED LIFTOFF PROCESS FOR ULTRA-SHALLOW MASK DEFINED NARROW TRACKWIDTH MAGNETIC SENSOR |
摘要 |
A method for manufacturing a magnetic read sensor allows for the construction of a very narrow trackwidth sensor while avoiding problems related to mask liftoff and shadowing related process variations across a wafer. The process involves depositing a plurality of sensor layers and forming a first mask structure. The first mask structure has a relatively large opening that encompasses a sensor area and an area adjacent to the sensor area where a hard bias structure can be deposited. A second mask structure is formed over the first mask structure and includes a first portion that is configured to define a sensor dimension and a second portion that is over the first mask structure in the field area. |
申请公布号 |
US2013284693(A1) |
申请公布日期 |
2013.10.31 |
申请号 |
US201213458374 |
申请日期 |
2012.04.27 |
申请人 |
ZHENG YI;MAO GUOMIN;SOUGRATI HICHAM M.;DANG XIAOZHONG;HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. |
发明人 |
ZHENG YI;MAO GUOMIN;SOUGRATI HICHAM M.;DANG XIAOZHONG |
分类号 |
G11B5/33 |
主分类号 |
G11B5/33 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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