发明名称 DIFFERENTIATED LIFTOFF PROCESS FOR ULTRA-SHALLOW MASK DEFINED NARROW TRACKWIDTH MAGNETIC SENSOR
摘要 A method for manufacturing a magnetic read sensor allows for the construction of a very narrow trackwidth sensor while avoiding problems related to mask liftoff and shadowing related process variations across a wafer. The process involves depositing a plurality of sensor layers and forming a first mask structure. The first mask structure has a relatively large opening that encompasses a sensor area and an area adjacent to the sensor area where a hard bias structure can be deposited. A second mask structure is formed over the first mask structure and includes a first portion that is configured to define a sensor dimension and a second portion that is over the first mask structure in the field area.
申请公布号 US2013284693(A1) 申请公布日期 2013.10.31
申请号 US201213458374 申请日期 2012.04.27
申请人 ZHENG YI;MAO GUOMIN;SOUGRATI HICHAM M.;DANG XIAOZHONG;HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. 发明人 ZHENG YI;MAO GUOMIN;SOUGRATI HICHAM M.;DANG XIAOZHONG
分类号 G11B5/33 主分类号 G11B5/33
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