SEMICONDUCTOR DEVICE MANUFACTURING METHOD, SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING DEVICE AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To form a thin film having low concentration of an impurity such as chlorine in a low temperature region.SOLUTION: A semiconductor device manufacturing method comprises: a process of forming a thin film on a substrate by performing a cycle a predetermine number of times, the cycle including a process of supplying a material gas to the substrate, and a process of supplying excited species generated by plasma excitation of a reaction gas at a plurality of excitation parts provided lateral to the substrate from respective excitation parts to the substrate. In the process of supplying the excited species from respective excitation parts, an in-plane distribution of the excited species in the substrate from at least one excitation part among the plurality of excitation parts is made different from an in-plane distribution of the excited species supplied from another excitation part different from the at least one excitation part.