发明名称 |
Silicon compound, silicon-containing compound, composition for forming resits underlayer film containing the same and patterning process |
摘要 |
The invention provides a silicon compound represented by the following general formula (A-1) or (A-2),
wherein, R represents a hydrocarbon group having 1 to 6 carbon atoms, R 1 and R 2 represent an acid labile group, R 3 represents a hydrogen atom or a monovalent organic group having 1 to 30 carbon atoms, k represents an integer of 1 or 2, m represents an integer of 0, 1, or 2, and n represents an integer of 0 or 1. There can be provided a resist underlayer film that can be applied not only to a resist pattern formed by a hydrophilic organic compound obtained in negative development but also to a resist pattern composed of a hydrophobic compound obtained in conventional positive development. |
申请公布号 |
EP2657240(A1) |
申请公布日期 |
2013.10.30 |
申请号 |
EP20130002020 |
申请日期 |
2013.04.17 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TSUTOMU, OGIHARA;TAKAFUMI, UEDA;YOSHINORI, TANEDA;MASAHIRO, KANAYAMA |
分类号 |
C07F7/18;C08L83/06;C09D183/06;G03F7/40;H01L21/30 |
主分类号 |
C07F7/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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