发明名称 |
Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process |
摘要 |
<p>There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.
<Chemistry id="chema01" num="0001"><Image id="ia01" he="46" wi="165" file="IMGA0001.TIF" imgContent="chem" imgFormat="TIFF" /></Chemistry></p> |
申请公布号 |
EP2533101(A3) |
申请公布日期 |
2013.10.30 |
申请号 |
EP20120003989 |
申请日期 |
2012.05.22 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
DOMON, DAISUKE;MASUNAGA, KEIICHI;WATANABE, SATOSHI |
分类号 |
G03F7/039;G03F7/004 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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