发明名称 LIQUID-GAS INTERFACE PLASMA DEVICE
摘要 A plasma system for treating a workpiece is disclosed. The plasma system includes: a plasma device including an electrode formed from a metal alloy and a dielectric layer covering the electrode, the dielectric layer including a distal portion extending distally past a distal end of the electrode by a predetermined distance; a liquid source configured to supply a liquid to a workpiece; an ionizable media source coupled to the plasma device and configured to supply ionizable media thereto; and a power source coupled to the electrode and configured to ignite the ionizable media at the plasma device to form a plasma effluent in the presence of the liquid, whereby the plasma effluent reacts with the liquid to form at least one reactive species that interacts with the workpiece.
申请公布号 EP2554028(A4) 申请公布日期 2013.10.30
申请号 EP20100849146 申请日期 2010.03.31
申请人 COLORADO STATE UNIVERSITY RESEARCH FOUNDATION 发明人 KOO, IL-GYO;COLLINS, GEORGE J.
分类号 H05H1/24;H05H1/42 主分类号 H05H1/24
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