发明名称 Wafer-trilayer adhesive layer-support composite, wafer support with trilayer adhesive layer for use in wafer processing, trilayer adhesive layer for use in wafer processing, method of manufacturing said composite and method of manufacturing a thin wafer using said composite
摘要 A wafer processing laminate is provided comprising a support (3), a temporary adhesive layer (2), and a wafer (1). The temporary adhesive layer (2) has a trilayer structure consisting of a first temporary bond layer (A) of thermoplastic siloxane bond-free polymer, a second temporary bond layer (B) of thermoplastic siloxane polymer, and a third temporary bond layer (C) of thermosetting modified siloxane polymer. In a peripheral region, the second layer (B) is removed so that the first layer (A) is in close contact with the third layer (C).
申请公布号 EP2657963(A2) 申请公布日期 2013.10.30
申请号 EP20130164812 申请日期 2013.04.23
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KATO, HIDETO;SUGO, MICHIHIRO;TAGAMI, SHOHEI;YASUDA, HIROYUKI
分类号 H01L21/683;C09J7/00;C09J7/02 主分类号 H01L21/683
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