发明名称 Field effect transistor
摘要 A field effect transistor includes: a buffer layer that is formed on a substrate; a high resistance layer or a foundation layer that is formed on the buffer layer; a carbon-containing carrier concentration controlling layer that is formed on the high resistance layer or the foundation layer; a carrier traveling layer that is formed on the carrier concentration controlling layer; a carrier supplying layer that is formed on the carrier traveling layer; a recess that is formed from the carrier supplying layer up to a predetermined depth; source/drain electrodes that are formed on the carrier supplying layer with the recess intervening therebetween; a gate insulating film that is formed on the carrier supplying layer so as to cover the recess; and a gate electrode that is formed on the gate insulating film in the recess.
申请公布号 US8569800(B2) 申请公布日期 2013.10.29
申请号 US201113076980 申请日期 2011.03.31
申请人 IKEDA NARIAKI;KOKAWA TAKUYA;IWAMI MASAYUKI;KATO SADAHIRO;FURUKAWA ELECTRIC CO., LTD. 发明人 IKEDA NARIAKI;KOKAWA TAKUYA;IWAMI MASAYUKI;KATO SADAHIRO
分类号 H01L31/072;H01L31/0336 主分类号 H01L31/072
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