| 摘要 |
A device is provided. The device includes first, second and third subpixels. The first sub-pixel includes an emissive layer having a first emitting material but not a second emitting material. The second sub-pixel includes an emissive layer having the second emitting material but not the first emitting material. The third sub-pixel includes an emissive layer having both the first and second emitting materials. A method of fabricating the device is provided. For a three subpixel device, a first electrode layer is deposited, having a first sub-pixel and a second sub-pixel. Then, in a first patterned deposition process, a first emitting material is deposited on the first sub-pixel and the third sub-pixel, but not the second sub-pixel. Then, in a second patterned deposition process, a second emitting material is deposited on the second sub-pixel and the third sub-pixel, but not the first sub-pixel. Then, a second electrode layer is deposited. The first, second and third subpixels may be defined, for example, by patterning in either or both of the first and second electrode layers. Preferably, the device and method include a fourth subpixel.
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