METHOD OF MANUFACTURING STAMP FOR IMPRINT LITHOGRAPHY AND THE DUPLICATED STAMP FOR USING THE SAME
摘要
<p>PURPOSE: A method for manufacturing a stamp for imprint lithography and a duplicated stamp manufactured by using the same are provided to obtain a complex stamp by performing an ultraviolet irradiation and a thermal curing process. CONSTITUTION: A resist (200) is coated on a substrate (100). A solvent in the resist is evaporated by a heating process. A master stamp (300) on the substrate is compressed. A k pattern is transferred to the resist. The resist is cured by an ultraviolet irradiation process. [Reference numerals] (AA,BB) Applied pressure</p>
申请公布号
KR101322607(B1)
申请公布日期
2013.10.29
申请号
KR20130029278
申请日期
2013.03.19
申请人
KOREA INSTITUTE OF MACHINERY & MATERIALS
发明人
LIM, HYUNG JUN;LEE, JAE JONG;CHOI, KEE BONG;KIM, GEE HONG