发明名称 DESIGN OF SPACER RESIN PATTERN USEFUL FOR REDUCTION OF CONNECTION LOSS OF LIGHT BETWEEN LIGHT EMITTING ELEMENT OR LIGHT RECEIVING ELEMENT AND OPTICAL WAVEGUIDE ON SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To form a spacer resin (SR) pattern layer for accurate alignment of a light emitting element or a light receiving element with both of an optical waveguide (WG) pattern layer and an electric circuit (EC) pattern layer, from a wafer level of a semiconductor.SOLUTION: A base layer which has a through hole (via) provided to electrically communicate with an electric circuit (EC) pattern layer and is made of a resin is formed on a semiconductor (GaAs) wafer. A truncated cone or polygonal pyramid-shaped three-dimensional reflecting surface is formed to guide output of emitted light to or input of received light from an optical waveguide (WG) pattern layer. A metal film being doughnut-shaped, circular, or polygonal in plan view is vapor-deposited in a prescribed range from a center positioned on the basis of the position of the through hole. A cone or pyramid-shaped mold is stamped to the center. The direction of light is corrected by a formed taper structure to increase tolerance for accuracy and to reduce light loss.
申请公布号 JP2013222075(A) 申请公布日期 2013.10.28
申请号 JP20120093713 申请日期 2012.04.17
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 TOKUNARI MASAO;NAKANO DAIKI;TSUKADA YUTAKA;TORIYAMA KAZUSHIGE
分类号 G02B6/122 主分类号 G02B6/122
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