| 摘要 |
PURPOSE: An organic metal depositing plasma chamber with a multi-type plasma discharging pipe is provided to improve the efficiency of a process as activated cleaning gas or reformed gas flows directly to a chamber body without being recombined. CONSTITUTION: An organic metal depositing plasma chamber (10) with a multi-type plasma discharging pipe includes a chamber body (11), a plasma generating module (20), a vaporizer (30), and a cleaning gas supply source (56). The plasma generating module includes a multi-type plasma discharging pipe, a discharging pipe head, and a ferrite core. Organic gas vaporized by the vaporizer in an organic metal deposition process flows to the chamber body via the multi-type plasma discharging pipe. The cleaning gas is activated inside the multi-type plasma charging pipe in a self-cleaning process and flows to the chamber body. [Reference numerals] (17,31) Heater power supply; (27) Impedance matching device; (40) Control device; (60) Collection trap; (61) Exhaust pump |
