| 摘要 |
PURPOSE: A film structure and a manufacturing method thereof are provided to increase transmissivity of visible light without adjusting the thickness of a metal layer through interaction of a first oxide layer and a second oxide layer, thereby reducing cost of production. CONSTITUTION: A film structure (100) comprises a transparent film (110); a first oxide layer (120) including one or more kinds of material selected between silicon oxide and indium tin oxide to be deposited on the first oxide layer (120); a metal layer (130) deposited on the first oxide layer; and a second oxide layer (140) including one or more kinds of material silicon oxide and indium tin oxide to be deposited on the top of the metal layer and to be exposed to the outer air. A manufacturing method for a film structure comprises the steps of: setting the transparent film, depositing the first oxide layer by plasma sputtering, depositing the metal layer by plasma sputtering, and depositing the second oxide layer by plasma sputtering. |
