| 摘要 |
PURPOSE: A multiple discharge tube plasma reactor having a multiple gas supply structure is provided to sufficiently supply high-capacity high-density active gas by remote. CONSTITUTION: A gas inlet is disposed in the top of an upper discharge tube. A lower discharge tube has two gas outlets. The two gas outlets are connected to two processing chambers (40a,40b) through each adapter (91a,91b). The two processing chambers independently perform a substrate processing process. Baffles (46a,46b) for gas distribution and substrate supports (42a,42b) for mounting substrates (44a,44b) are provided in the inside of the two processing chambers. [Reference numerals] (10f) Multi discharge tube plasma reactor; (90) Gas supply source; (94) Vacuum pump |
