| 摘要 |
<p>A stamp for imprint lithography and imprint lithography method using the same are provided to avoid attachment of particles and obtain uniform patterns with generation of static electricity suppressed, since the material of a back support with high light transmissivity and conductivity is coated on a backside of a polymer resin mold having a pattern. A stamp for imprint lithography comprises a polymer resin mold(102b), a back support(103), and a discharge plate or ground wire. The polymer resin mold has one uneven side to form a pattern. The back support having desired light transmissivity and conductivity is attached onto the other side of the uneven side of the polymer resin mold. The discharge plate or ground wire is connected to the back support.</p> |
