发明名称 MASK UNIT AND SUBSTRATE PROCESSING DEVICE
摘要 <p>A mask unit comprises: a mask holding unit (20) which holds a mask pattern on a cylindrical surface with a prescribed radius centered on a first axial line (AX1) and is rotatable around the first axial line; a support unit (22) for supporting the mask holding unit in a contactless or low friction state so that the mask holding unit is able to rotate around and move in the direction of the first axial line; and a pair of driving units (MT) which is provided on both sides in the first axial line direction of the mask holding unit and drives the mask holding unit by propelling the mask holding unit to rotate around the first axial line.</p>
申请公布号 WO2013157356(A1) 申请公布日期 2013.10.24
申请号 WO2013JP58686 申请日期 2013.03.26
申请人 NIKON CORPORATION 发明人 SUZUKI TOMONARI
分类号 G03F7/24;G03F7/20;H01L21/027;H01L21/683 主分类号 G03F7/24
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