发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, LIQUID CRYSTAL DISPLAY DEVICE, AND ORGANIC EL DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition capable of giving a cured film that has having high sensitivity, high durability against a stripping solution or NMP (N-methyl pyrrolidone), good adhesiveness to a transparent electrode film or metal, excellent dry etching durability and that hardly induces a display failure in a display device.SOLUTION: The positive photosensitive resin composition comprises: (component A) a polymer component including a polymer satisfying at least one of the following conditions (1) and (2); (component C) a photoacid generator; and (component D) a solvent. (1) A polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group and (a2) a structural unit having a crosslinking group; and (2) a polymer having (a1) a structural unit having a group in which an acid group is protected by an acid decomposable group and a polymer having (a2) a structural unit having a crosslinking group. |
申请公布号 |
JP2013218265(A) |
申请公布日期 |
2013.10.24 |
申请号 |
JP20120210434 |
申请日期 |
2012.09.25 |
申请人 |
FUJIFILM CORP |
发明人 |
YONEZAWA HIROYUKI;KAWASHIMA TAKASHI;YAMAZAKI KENTA;HIKITA MASANORI |
分类号 |
G03F7/075;C08F212/14;C08F220/28;G03F7/004;G03F7/039;G03F7/40;H01L21/027;H01L51/50;H05B33/10;H05B33/12;H05B33/22 |
主分类号 |
G03F7/075 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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