发明名称 |
METHODS OF PROVIDING PATTERNED CHEMICAL EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY |
摘要 |
A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template. |
申请公布号 |
WO2013127608(A3) |
申请公布日期 |
2013.10.24 |
申请号 |
WO2013EP52306 |
申请日期 |
2013.02.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
PEETERS, EMIEL;KETELAARS, WILHELMUS;WUISTER, SANDER;KOOLE, ROELOF;VAN HEESCH, CHRIS;BRIZARD, AURELIE;BOOTS, HENRI;NGUYEN, THANH;YILDIRIM, OKTAY |
分类号 |
G03F7/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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地址 |
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