发明名称 EEPROM cell structure and a method of fabricating the same
摘要 An electrically erasable programmable read only memory (EEPROM) cell structure and a method of fabricating the same. The EEPROM cell comprising a substrate comprising two shallow trench isolation (STI) structures separated by a substrate portion; an intermediate patterned layer formed on the substrate such that the patterned layer covers respective portions of each STI structure; a floating gate bridging between the STI structures such that the floating gate extends over the intermediate patterned layer; a dielectric layer formed over the floating gate; and a control gate formed over the dielectric layer.
申请公布号 US8564043(B2) 申请公布日期 2013.10.22
申请号 US201113005693 申请日期 2011.01.13
申请人 HUANG SHENG HE;HO ENG KEONG;PEH PING YAW;SYSTEMS ON SILICON MANUFACTURING CO. PTE. LTD. 发明人 HUANG SHENG HE;HO ENG KEONG;PEH PING YAW
分类号 H01L29/788 主分类号 H01L29/788
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