发明名称 Trench MOSFET with trenched floating gates in termination
摘要 A trench MOSFET comprising multiple trenched floating gates in termination area is disclosed. The trenched floating gates have trench depth equal to or deeper than body junction of body regions in active area. The trench MOSFET further comprise an EPR surrounding outside the multiple trenched floating gates in the termination area.
申请公布号 US8564053(B2) 申请公布日期 2013.10.22
申请号 US201213459684 申请日期 2012.04.30
申请人 HSIEH FU-YUAN;FORCE MOS TECHNOLOGY CO., LTD. 发明人 HSIEH FU-YUAN
分类号 H01L29/76;H01L29/94 主分类号 H01L29/76
代理机构 代理人
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