PELLICLE, PRESSURE-SENSITIVE ADHESIVE FOR PELLICLE, PHOTOMASK WITH PELLICLE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

Provided is a pellicle which has a pressure-sensitive adhesive generating little outgas and with which it is possible to reduce paste residue when peeled from a photomask after exposure. This pellicle comprises a pellicle frame, a pellicle film provided in a tensioned state on one end of the pellicle frame, and a pressure-sensitive adhesive adhering to the other end of the pellicle frame, wherein the pressure-sensitive adhesive comprises a (meth)acrylic acid alkyl ester copolymer and a silane compound, the (meth)acrylic acid alkyl ester copolymer being a copolymer of a monomer having a reactive functional group of (meth)acrylic acid alkyl ester having an alkyl group with carbon number of 4 to 14, with at least either an isocyanate group or an epoxy group.