发明名称 |
APPARATUS FOR CHEMICAL VAPOR DEPOSITION FOR DIAMOND FILM AND METHOD FOR SYNTHESIS OF DIAMOND FILM |
摘要 |
PURPOSE: A chemical vapor deposition device for a diamond composition and a diamond composition method using the same are provided to suppress an increase on substrate temperature and to improve the extent of activation of a diamond composition gas or ion at the same time. CONSTITUTION: A chemical vapor deposition device for a diamond composition includes a chamber in which a chemical vapor deposition process is progressed; a substrate formed inside the chamber and provides a space for the growth of a diamond; and a heat insulation structure formed at a position spaced from the top of the substrate. The heat insulation structure includes an opening in which a precursor gas can be moved. A filament of a high melting point is arranged on an upper space of the chamber. The heat insulation structure is arranged between the filament and the substrate. [Reference numerals] (AA) High melting point filament; (BB) Substrate; (CC) Water-cooling block |
申请公布号 |
KR20130114994(A) |
申请公布日期 |
2013.10.21 |
申请号 |
KR20120037503 |
申请日期 |
2012.04.10 |
申请人 |
KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY |
发明人 |
BAIK, YOUNG JOON;PARK, JONG KEUK;LEE, WOOK SEONG |
分类号 |
C23C16/44;C23C16/448;C30B29/04 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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