MASTER TEMPLATE FOR NANOIMPRINT AND MANUFACTURING METHOD OF REPLICA TEMPLATE

摘要

PROBLEM TO BE SOLVED: To provide a master template which prevents an excess photocuring material on the master template side from affecting the next nanoimprint and reduces the number of times of cleaning smudges on the master template when a replica template is manufactured by a nanoimprint method, and to provide a manufacturing method of the replica template.SOLUTION: A master template 10 is used for manufacturing a replica template by transferring an irregular pattern to a light-transmissive substrate using a nanoimprint method. A field area 12 provided with the irregular pattern is formed on one main surface of a quartz glass substrate 11 having a parallel plane. A recessed part 13 for absorbing and accumulating an excess photocuring material occurring during the nanoimprint is provided at the outer side of the field area 12.