发明名称 EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To measure the position of a substrate stage by switching plural laser interferometers for use.SOLUTION: A control unit measures the position of a substrate stage PST in a Y axis direction with a laser interferometer 21YA during scanning exposure and laser interferometers 21YB, 21YBduring deceleration and step movement. When switching a laser interferometer to be used, between the laser interferometer 21YA and the laser interferometers 21YB, 21YB, the control unit resets the measurement results of the laser interferometers 21YA, 21YB, 21YBon the basis of the measurement result of an encoder system.
申请公布号 JP2013214025(A) 申请公布日期 2013.10.17
申请号 JP20120085425 申请日期 2012.04.04
申请人 NIKON CORP 发明人 SHIRATO AKIHITO
分类号 G03F7/20;G01B11/00;H01L21/027;H01L21/68 主分类号 G03F7/20
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