发明名称 MASK SHEET FOR PRODUCING SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE BY USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a mask sheet capable of taping on a L/F (lead frame) at a lower temperature than a thermoplastic mask sheet, hardly causing such thermal deterioration that an adhesive deposit is generated at the separation of the mask sheet even after being exposed to a high temperature, having flatness with few warps, harder and more excellent in W/B (wire bonding) characteristics at a high temperature than conventional mask sheets, causing less leak of a molding resin at sealing than an adhesive mask sheet, and providing lightly peelable properties hardly causing adhesive deposits even after a plasma cleaning process.SOLUTION: A mask sheet for producing a semiconductor device is obtained by laminating a thermosetting type adhesive layer on one surface of a base material layer, and is to be pasted to a metal plate peelably, in which the thermosetting type adhesive layer contains a polyimide resin containing a siloxane skeleton, a polyfunctional epoxy resin, a both-terminal epoxy resin, a curing agent and a fluorine-based additive.
申请公布号 JP2013213143(A) 申请公布日期 2013.10.17
申请号 JP20120084238 申请日期 2012.04.02
申请人 TOMOEGAWA PAPER CO LTD 发明人 YAMAI ATSUSHI;HORIIE TAKAYUKI;MORI TAKAHIRO;ICHIKAWA TAKAMASA;YAMADA HIROMI;MACHII SATORU
分类号 C09J7/02;C09J11/06;C09J163/00;C09J179/04;H01L21/56;H01L23/50 主分类号 C09J7/02
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