| 摘要 |
A projection exposure apparatus transfers a pattern formed on a mask R onto a substrate W via a projection optical system PL. The projection exposure apparatus includes electricity removal units (40 to 46) which removes electricity from a liquid (7) supplied to a space between the projection optical system PL and the surface of a substrate W. This makes it possible to prevent destruction of the circuit pattern or malfunction of the device which would otherwise caused by charging of the liquid. |
