| 摘要 |
PROBLEM TO BE SOLVED: To provide an actinic ray-sensitive or radiation-sensitive resin composition from which a pattern showing high sensitivity, high resolution and good roughness characteristics, all in satisfactory levels, in particular, to provide an actinic ray-sensitive or radiation-sensitive resin composition from which a pattern (including an isolated line pattern) showing all of these characteristics in satisfactory levels under a larger-area exposure condition, and to provide an actinic ray-sensitive or radiation-sensitive film formed from the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method.SOLUTION: The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) having at least one phenolic hydroxyl group and at least one group derived in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group expressed by general formula (1). In the formula, Mrepresents a single bond or a divalent linking group; and Qrepresents an alkyl group, a cycloalkyl group or an aryl group. |
