| 摘要 |
PURPOSE: A substrate cleaning apparatus is provided to improve cleaning efficiency by mixing at least two kinds of solutions and supplying the mixed solution to a substrate. CONSTITUTION: A scrubbing brush is installed on a cleaning roller (110). A fixed body (130) forms a first inlet (131a) and a second inlet (132a). A first solution flows in the first inlet. A second solution flows in the second inlet. A rotary body (120) forms a liquid path communicating a mixing chamber with a hollow part. [Reference numerals] (161) First solution supply unit; (162) Second solution supply unit |
