发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION COMPRISING ORGANOPOLYSILOXANE |
摘要 |
PURPOSE: A photosensitive resin composition is provided to form a uniform and stable coated film when coated on a substrate, to generate no stain such as resin stain and cumulus stain, and to facilitate the pattern formation. CONSTITUTION: A photosensitive resin composition comprises a) an organic siloxane polymer including a siloxane unit having at least one functional group selected from the group consisting of oxetane, epoxy, hydroxy and thiol; b) an acrylate compound having at least one ethylenic unsaturated double bond; c) a polymer or an oligomer including at least one epoxy (however, it is different from a) organic siloxane polymer); and D) an acid generator. |
申请公布号 |
KR20130113635(A) |
申请公布日期 |
2013.10.16 |
申请号 |
KR20120035961 |
申请日期 |
2012.04.06 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. |
发明人 |
KIM, JUNG HOON;KWON, JIN;LEE, SO NA |
分类号 |
G03F7/075;G03F7/027 |
主分类号 |
G03F7/075 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|