发明名称 PHOTOSENSITIVE RESIN COMPOSITION COMPRISING ORGANOPOLYSILOXANE
摘要 PURPOSE: A photosensitive resin composition is provided to form a uniform and stable coated film when coated on a substrate, to generate no stain such as resin stain and cumulus stain, and to facilitate the pattern formation. CONSTITUTION: A photosensitive resin composition comprises a) an organic siloxane polymer including a siloxane unit having at least one functional group selected from the group consisting of oxetane, epoxy, hydroxy and thiol; b) an acrylate compound having at least one ethylenic unsaturated double bond; c) a polymer or an oligomer including at least one epoxy (however, it is different from a) organic siloxane polymer); and D) an acid generator.
申请公布号 KR20130113635(A) 申请公布日期 2013.10.16
申请号 KR20120035961 申请日期 2012.04.06
申请人 ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD. 发明人 KIM, JUNG HOON;KWON, JIN;LEE, SO NA
分类号 G03F7/075;G03F7/027 主分类号 G03F7/075
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