METHOD OF FABRICATING AND CORRECTING NANO-IMPRINT LITHOGRAPHY TEMPLATES

摘要

PURPOSE: A manufacturing method of templates for the nano-imprint lithography is provided to be able to more elaborately manufacture and correct the size, uniformity and alignment of the imprint pattern as the templates are manufactured by using a scanning lithography facility. CONSTITUTION: A manufacturing method of templates for the nano-imprint lithography comprises that a reticle (140) is installed on a reticle stage (130) in a scanning lithography facility (100) comprising a light source, the reticle stage and a template stage (170), that a template substrate (310) is mounted on the template stage, and that a tilt scanning process, that the center route of the light generated from the light source is irradiated on the template substrate at a tilt after the reticle, is performed. The scanning lithography facility further comprises a slit part (150) positioned between the reticle stage and the template stage. Most of the light passing through the reticle is blocked by a slit plate (151) in the slit part. A part of the light passing through the reticle passes a slit (155) in the slit part, and is irradiated on the template substrate. The reticle stage and the template stage move to the direction perpendicular to the long direction of the slit. The light is irradiated on the template substrate at a tilt by moving the reticle stage at a tilt.